Substrate flux cleaning
We have substrate cleaning machines and ultrasonic cleaning machines, so we can achieve precise cleaning according to your needs, including flux removal and fine dirt on substrate surfaces and components!
While I believe there are many cases of substrate mounting using no-clean paste, cleaning has become essential to ensure high reliability. Our company has extensive experience in substrate cleaning for various prototype and mass production assemblies, and we have received great acclaim from many customers. We use IPA (isopropyl alcohol) and environmentally friendly hydrocarbon and glycol-based cleaning solutions to remove flux adhered to the substrate. We propose the optimal cleaning method considering the condition of the mounted components and flux, using techniques such as ultrasonic cleaning, electric brushing cleaning, and manual finishing cleaning, and we are flexible in responding to customer requests. If you are concerned about the cleanliness of the flux and wonder how well it can be cleaned, we also conduct free test cleaning for one unit (up to three units total) using each method. * If it is not RoHS compliant (such as eutectic), only manual finishing cleaning will be available. * Please note that free test cleaning may incur charges for small order quantities, so please consult with us first.
- Company：愛恵電子
- Price：Other
